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Journal of Materials Science and Technology

Volumn 16, Issue 1, 2000, Pages 94-96

High quality SiGe layer deposited by a new ultrahigh vacuum chemical vapor deposition system

(4) Luo, Guangli a Lin, Xiaofeng a Chen, Peiyi a Tsian, Peixin a

a TSINGHUA UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006079652 PISSN: 10050302 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (7)

References (16)

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