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Volumn 6, Issue 8, 1994, Pages 1452-1456

Novel Functional Polymers from N-(Tosyloxy)maleimide. Photochemical Acid Generation in Solid-State and Application as Resist Materials

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0006032563     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm00044a051     Document Type: Article
Times cited : (29)

References (22)
  • 8
    • 0039138838 scopus 로고
    • ACS Symposium Series No. 346, Bowden, M. J., Turner, S. R., Eds.: American Chemical Society: Washington, DC, Chapter 17
    • Turner, S. R.; Ahn, K.-D.; Willson, C. G. In Polymers for High Technology; ACS Symposium Series No. 346, Bowden, M. J., Turner, S. R., Eds.: American Chemical Society: Washington, DC, 1987; Chapter 17, p 200
    • (1987) Polymers for High Technology , pp. 200
    • Turner, S.R.1    Ahn, K.-D.2    Willson, C.G.3
  • 9
    • 0642366462 scopus 로고
    • ACS Symposium Series No. 537, Thompson, L. F., Willson, C. G., Tagawa, S., Eds.; American Chemical Society: Washington, DC Chapter 9
    • Ahn, K.-D.; Koo, D.-I. In Polymers for Microelectronics; ACS Symposium Series No. 537, Thompson, L. F., Willson, C. G., Tagawa, S., Eds.; American Chemical Society: Washington, DC, 1994; Chapter 9, p 124
    • (1994) Polymers for Microelectronics , pp. 124
    • Ahn, K.-D.1    Koo, D.-I.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.