Synchrotron radiation induced H2O desorption from aluminum surfaces

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 3, 1997, Pages 736-739

  Chen, J R ^a,b   Hsiung, G Y ^a   Huang, J R ^a   Chang, C M ^b   Liu, Y C ^a,b  

^a NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006012852     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580812     Document Type: Article

References (10)

1. Y. C. Liu, J. R. Huang, T. Y. Wu, and J. R. Chen, Vacuum 44, 435 (1993).
2. M. Li and H. F. Dylla, J. Vac. Sci. Technol. A 11. 1720 (1993).
3. K. Tatenuma, T. Momose, and H. Ishimaru, J. Vac. Sci. Technol. A 11, 1719 (1993).
4. J. R. Chen, J. R. Huang, G. Y. Hsiung, T. Y. Wu, and Y. C. Liu, J. Vac. Sci. Technol. A 12, 1750 (1994).
5. M. Li and H. F. Dylla, J. Vac. Sci. Technol. A 12, 1772 (1994).
6. J. A. Basford, J. Vac. Sci. Technol. A 12, 1778 (1994).
7. M. Li and H. F. Dylla, J. Vac. Sci. Technol. A 13, 571 (1995).
8. J. R. Chen, C. H. Lee, J. C. Chen, H. L. Hsieh, and Y. C. Liu, J. Vac. Sci. Technol. A 5, 3422 (1987).
9. J. R. Chen, D. J. Wang, G. S. Chen, and Y. C. Liu, J. Vac. Soc. ROC 2, 20 (1989).
10. J. R. Chen, G. S. Chen. D. J. Wang, G. Y. Hsiung, and Y. C. Liu, Vacuum 41, 2079 (1990).