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Journal of Applied Physics

Volumn 81, Issue 8, 1997, Pages 3453-3456

Electron paramagnetic resonance study of amorphous silicon produced by Kr+ ion implantation into silicon

(3) Rakvin, B a Pivac, B a Reitano, R b

a RUDER BO KOVI INSTITUTE (Croatia)

b INFM (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005953512 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.364704 Document Type: Article

Times cited : (8)

References (14)

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