Liftoff-technique of single-crystal diamond plates: Study of the lattice damage of the implanted substrates and the crystalline quality of the homoepitaxial films by ion channelling

Diamond and Related Materials

Volumn 6, Issue 1, 1997, Pages 149-152

  Samlenski, R ^a   Gartner H ^a   Locher, R ^b   Koidl, P ^b   Brenn, R ^a  

^a UNIVERSITY OF FREIBURG   (Germany)

^b FRAUNHOFER INSTITUTE FOR APPLIED SOLID STATE PHYSICS IAF   (Germany)

Author keywords

Crystalline quality; Homoepitaxial diamond films; Lattice damage

Indexed keywords

EID: 0005871114     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(96)00700-5     Document Type: Article

References (7)

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2. J.D. Hunn and C.P. Christensen, Solid State Technol., December (1994).
3. G. Janssen and L.J. Giling, Diamond Relat. Mater., 4 (1995) 1025.
4. R. Samlenski, J. Schmälzlin, R. Brenn, C. Wild, W. Müller-Sebert and P. Koidl, Diamond Rel. Mater., 4 (1995) 503.
5. R. Locher, D. Behr, H. Güllich, N. Herres, P. Koidl, R. Samlenski and R. Brenn, Diamond Rel. Mater., submitted.
6. L.C. Feldman, J.W. Mayer and S.T. Picraux, Material Analysis by Ion Channeling, Academic Press, New York, 1980.
7. C. Wild, R. Kohl, N. Herres, W. Müller-Sebert and P. Koidl, Diamond Rel. Mater., 3 (1994) 373.