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Journal of Applied Physics

Volumn 83, Issue 12, 1998, Pages 7635-7639

Ultrathin silicon oxynitride films grown by Ar/N2O remote plasma processing

(2) Smith, Bradley C a Lamb, H Henry a

a North Carolina State University (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005783102 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.367881 Document Type: Article

Times cited : (12)

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