Generation and growth of nanoparticles in low-pressure plasmas

Pure and Applied Chemistry

Volumn 71, Issue 10, 1999, Pages 1871-1877

  Kortshagen, U R ^a   Bhandarkar, U V ^a   Swihart, M T ^b   Girshick, S L ^a  

^a University of Minnesota   (United States)

^b Dept of Chemical Engineering ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005769188     PISSN: 00334545     EISSN: None     Source Type: Journal    
DOI: 10.1351/pac199971101871     Document Type: Article

References (5)

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3. A. Bouchoule, L. Boufendi. Particulate formation and dusty plasma behaviour in argon-silane rf discharge. Plasma Sources Sci. Technol. 2, 204 (1993).
4. L. Boufendi, A. Bouchoule. Particle nucleation and growth in a low-pressure argon-silane discharge. Plasma Sources Sci. Technol. 3, 263 (1994).
5. M. T. Swihart, S. L. Girshick. Thermochemistry and kinetics of silicon hydride cluster formation during thermal decomposition of silane. J. Phys. Chem. B. 103(1), 64-76 (1999).