High-efficiency binary phase-transmission-grating using e-beam lithography

Journal of Modern Optics

Volumn 45, Issue 7, 1998, Pages 1487-1494

  Glaser, T ^a   Schroter S ^a   Pohlmann R ^a   Fuchs, H J ^b   Bartel, H ^a  

^a LEIBNIZ INSTITUTE OF PHOTONIC TECHNOLOGY   (Germany)

^b FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005736329     PISSN: 09500340     EISSN: 13623044     Source Type: Journal    
DOI: 10.1080/09500349808230643     Document Type: Article

References (13)

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