Modeling of plasma chemical processes in the artificial ionized layer in the upper atmosphere by the nanosecond corona discharge

Physics Letters A

Volumn 179, Issue 2, 1993, Pages 122-126

  Vikharev, A L ^a   Gorbachev, A M ^a   Ivanov, O A ^a   Kolisko, A L ^a   Litvak, A G ^a  

^a INSTITUTE OF APPLIED PHYSICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005654679     PISSN: 03759601     EISSN: None     Source Type: Journal    
DOI: 10.1016/0375-9601(93)90660-R     Document Type: Article

References (8)

1. An ionized layer in a gas (in the atmosphere)
2. Electrodynamics of nonequilibrium HF discharge in wave fields
3. Evaluated kinetic and photochemical data for atmospheric chemistry