Reactive ion etch damages in inverted, trilayer thin-film transistor

Applied Physics Letters

Volumn 61, Issue 23, 1992, Pages 2790-2792

  Kuo, Yue ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

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EID: 0005624802     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.108093     Document Type: Article

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