The effect of Cl coverage on Si(100) surface reactivity: Implications for Cl etching of Si

Journal of Physics Condensed Matter

Volumn 10, Issue 21, 1998, Pages 4515-4522

  Wu, Christine J ^a   Klepeis, John E ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005590411     PISSN: 09538984     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-8984/10/21/009     Document Type: Article

References (20)

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16. Using an all-electron total-energy method we obtain an energy difference of 0.198 eV between the spin-polarized and paramagnetic free Cl atoms.
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