Photoelectron emission microscopy and its application to the study of polymer surfaces

Acta Physica Polonica A

Volumn 91, Issue 5, 1997, Pages 923-927

  Cossy Favre, A ^a   Diaz, J ^a   Anders, S ^a   Padmore, H ^a   Liu, Y ^b   Samant, M ^b   Stohr J ^b   Brown, H ^b   Russell, T P ^b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005526458     PISSN: 05874246     EISSN: None     Source Type: Journal    
DOI: 10.12693/APhysPolA.91.923     Document Type: Article

References (14)

1. E. Brücke, Z. Phys. 80, 448 (1933).
2. Ultramicroscopy 36 (1991).
3. B.P. Tonner, G.R. Harp, J. Vacuum Sci. Technol A 7, 1 (1989).
4. B.P. Tonner, G.R. Harp, Rev. Sci. Instrum. 59, 853 (1988).
5. J. Stöhr, NEXAFS Spectroscopy, Surface Science, Vol. 25, Springer, Berlin 1992.
6. H. Tanaka, Europhys. Lett. 24, 665 (1993) and references therein.
7. A.J. Liu, D.J. Durian, E. Herbolzheimer, S.A. Safran, Phys. Rev. Lett. 65, 1897 (1990).
8. S. Reich, Y. Cohen, J. Polymer Sci. Polymer Phys. Ed. 19, 1255 (1981).
9. T. Slawecki, A. Karim, S.K. Kumar, T.P. Russell, S.K. Satija, C.C. Han, Y. Liu, M.H. Rafailovich, J. Sokolov, R. Overney, submitted to Europhys. Lett.
10. H. Ade, X. Zhang, S. Cameron, C. Costello, J. Kirz, S. Williams, Science 258, 972 (1992).
11. D. Dunham, D.M. Desloge, G.F. Rempfer, W.P. Skoczyclas, T.B. Tonner, Nucl. Instrum. Methods Phys. Res. A 347, 441 (1994).
12. G.F. Rempfer, J. Appl. Phys. 57, 2385 (1985).
13. A. Warwick, P. Heimann, D. Mossessian, W. McKinney, H.A. Padmore, Rev. Sci. Instrum. 66, 2037 (1995).
14. G.F. Rempfer, J. Appl. Phys. 67, 6027 (1990).