1-kW industrial excimer laser (308-nm)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3343, Issue , 1998, Pages 687-691

  Timmermans, John C ^a  

^a Nederlands Centrum voor Laser Research BV   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; INDUSTRIAL APPLICATIONS; LASER ABLATION; LASER APPLICATIONS; PULSED LASER DEPOSITION; SURFACE TREATMENT;

HIGH AVERAGE POWER; SHORT WAVELENGTHS;

GAS LASERS;

EID: 0005494585     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.321592     Document Type: Conference Paper

References (2)

1. J.C.M. Timmermans, "Double discharge XeCl-laser", thesis University Twente, Enschede, The Netherlands, 1995
2. R.M. Hofstra, F.A. van Goor and W.J. Witteman, "Beam divergence studies on hard edge unstable resonators for a long pulse XeCl excimer laser", Optics Communications 144 pp. 43-49, 1997