Effect of silica overlayers on laser damage of HfO2-SiO 2 56° incidence high reflectors

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2714, Issue , 1996, Pages 550-559

  Walton, Christopher C ^a,b   Génin, Francois Y ^a   Chow, Robert ^a   Kozlowski, Mark R ^a   Loomis, Gary E ^a   Pierce, Edward L ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b Lawrence Berkeley National Laboratory   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HAFNIUM COMPOUNDS; LASER DAMAGE; OPTICAL MATERIALS; POLARIZATION; REFLECTION; SILICA; SILICON COMPOUNDS;

ANGLE DEPENDENCES; BOTTOM SURFACES; DAMAGE MORPHOLOGIES; DAMAGE RESISTANCES; DAMAGE THRESHOLDS; FLUENCE; HIGH REFLECTORS; INTRINSIC STRESSES; OBLIQUE INCIDENCES; OPTICAL THICKNESSES; OVERLAYER THICKNESSES; OVERLAYERS; P POLARIZATIONS;

LASERS;

EID: 0005448486     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240406     Document Type: Conference Paper

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