Contact-cooled U-monochromators for high heat load x-ray beamlines

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2855, Issue , 1996, Pages 232-239

  Khounsary, A ^a   Yun, W ^a   Trakhtenberg, E ^a   Xu, S ^a   Assoufid, L ^a   Lee, W K ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

Contact cooled; Monochromator; Thermal management; X ray

Indexed keywords

MONOCHROMATORS; TEMPERATURE CONTROL; THERMAL LOAD; THERMONUCLEAR REACTIONS; X RAYS;

BEAM PROFILES; COOLING CHANNELS; CRYSTAL GEOMETRY; CRYSTAL INTERFACES; HIGH HEAT LOAD; REFLECTED BEAM; SILICON CRYSTAL; X-RAY BEAMLINES;

HEAT FLUX;

EID: 0005322515     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.259834     Document Type: Conference Paper

References (4)

1. Khounsary, A. M. and W. Yun, "An Optional Contact Cooling of High Heat-Load X-ray Mirrors", Rev. Sci Instrum., Vol. 67, No. 9, Sept. 1996.
2. Rogers, C. S., D. M. Mills, W. K. Lee, and P. B. Fernandez, "Cryogenically Cooled, Thin Crystal Monochromators for Undulator Beams at the APS", in these proceedings, SPIE Vol. 2855, 1996.
3. Yun, W., B. Lai, Z. Cai, D. Shu, A. Khounsary, J. Barraza, and D. Legnini, "Development of a dedicated insertion device beamline for x-ray microfocusing- and coherence-based techniques at the Advanced Photon Source", Rev. Sci Instrum., Vol. 67, No. 9, Sept. 1996.
4. Yun, W., A. Khounsary, B. Lai, and E. Gluskin, "Use of a Mirror as the First Optical Component for an Undulator Beamline at the APS", Argonne National Laboratory Report, ANL/APSATB-2, Sept. 19, 1992.