Monitoring of deposition and dry etching of Si/SiGe multiple stacks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 1, 1996, Pages 102-105

  Tillack, B ^a   Richter, H H ^a   Ritter, G ^a   Wolff, A ^a   Morgenstern, G ^a   Eggs, C ^a,b  

^a IHP   (Germany)

^b UNIVERSITY OF GREIFSWALD   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005264677     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589034     Document Type: Article

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