Fabrication of double-gated Si field emitter arrays for focused electron beam generation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 13, Issue 5, 1995, Pages 1968-1972

  Itoh, Junji ^a   Tohma, Yasushi ^a   Morikawa, Kazutoshi ^a   Kanemaru, Seigo ^a   Shimizu, Keizo ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARRAYS; ELECTRIC CURRENTS; ELECTRODES; ELECTRON EMISSION; ELECTROSTATICS; LENSES; PHOSPHORS; SEMICONDUCTING SILICON; TRIODES;

CHARGE SIMULATION METHOD; ELECTRON TRAJECTORIES; ELECTROSTATIC LENS; FIELD EMITTER ARRAYS; IN PLANE FOCUSING;

ELECTRON BEAMS;

EID: 0005264543     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588116     Document Type: Article

References (14)