A SIMS study on secondary ion formation during low-energy methyl ion beam deposition

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 108, Issue 1-2, 1996, Pages 75-80

  Ohno, Hideki ^a   Aoki, Yasushi ^b   Nagai, Siro ^b  

^a MEISEI UNIVERSITY   (Japan)

^b TAKASAKI ADVANCED RADIATION RESEARCH INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005185346     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0168-583X(95)00872-1     Document Type: Article

References (10)

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