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Volumn 69, Issue 6, 1998, Pages 2320-2324

Electron cyclotron resonance plasma ion source for material depositions

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0005185317     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1148938     Document Type: Article
Times cited : (15)

References (23)
  • 19
    • 85034481330 scopus 로고    scopus 로고
    • CEA/DTA/LETI (private communication)
    • E. Quesnel and J. Y. Robic, CEA/DTA/LETI (private communication).
    • Quesnel, E.1    Robic, J.Y.2
  • 23
    • 85034465396 scopus 로고    scopus 로고
    • CEA/DTA/LETI (private communication)
    • M. N. Semeria and A. Perrin, CEA/DTA/LETI (private communication).
    • Semeria, M.N.1    Perrin, A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.