Effect of magnetic annealing on the behavior of FeTaN films

Journal of Applied Physics

Volumn 81, Issue 8 PART 2A, 1997, Pages 4498-4500

  Viala, B ^a   Inturi, V R ^a   Barnard, J A ^a  

^a University of Alabama   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005017653     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.364938     Document Type: Article

References (7)

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5. H. Hoffmann and T. Fujii, J. Magn. Magn. Mater. 128, 395 (1993).
6. S. Chikazumi, J. Phys. Soc. Jpn. 5, 327 (1950).
7. G. De Vries, D. W. Van Geest, R. Gersdorf, and G. W. Rathenau, Physica (Amsterdam) 25, 1131 (1959).