Simple equipment tolerant reflectometry for monitoring of molecular beam epitaxy and metalorganic chemical vapor deposition growth

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 3, 1996, Pages 946-951

  Bean, J C ^a   Peticolas, L J ^a   Lum, R ^a   McDonald, M L ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005007065     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580420     Document Type: Article

References (50)

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