Is F3+ viable? A high-level ab initio comparison of F3+ and Cl3+

Journal of Chemical Physics

Volumn 109, Issue 5, 1998, Pages 1772-1780

  Valeev, Edward F ^a   Botee, Hozefa M ^a   Schaefer, Henry F ^a  

^a UNIVERSITY OF GEORGIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0004858636     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.476752     Document Type: Article

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