Strain relief of metastable GeSi layers on Si(100)

Journal of Applied Physics

Volumn 75, Issue 9, 1994, Pages 4475-4481

  Bai, G ^a   Nicolet, M A ^a   Chern, C H ^b   Wang, K L ^b  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0004764350     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.355936     Document Type: Article

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