Ga focused-ion-beam shallow-implanted quantum wires

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 5, 1997, Pages 1657-1660

  Itoh, M ^a   Saku, T ^b   Hirayama, Y ^b   Tarucha, S ^b  

^a NTT CORPORATION   (Japan)

^b NTT Basic Research Laboratories   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0004663373     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589350     Document Type: Article

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