Macrostress formation in thin films and its investigation by X-ray diffraction

ASDAM 1998 Conference Proceedings: 2nd International Conference on Advanced Semiconductor Devices And Microsystems

Volumn 1998-October, Issue , 1998, Pages 227-230

  Sutta, P ^a   Jackuliak, Q ^b  

^a Military Academy of Slovakia   (Slovakia)

^b UNIVERSITY OF ILINA   (Slovakia)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELASTICITY; MICROSYSTEMS; SEMICONDUCTOR DEVICES; STRUCTURAL DESIGN; SUBSTRATES; X RAY DIFFRACTION;

ELASTIC STRESS; MACROSTRESSES; THERMAL COEFFICIENTS; THIN FILM SUBSTRATE;

THIN FILMS;

EID: 0004614791     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ASDAM.1998.730205     Document Type: Conference Paper

References (8)

1. A. Segmi'iller, I.C. Noyan, V.S. Speriosu, Prog. Cryst. Growth and Charact. 18, 21-66, 1989
2. V. Tvarozek et tA, Sensors and Actuators B, 18-19, 597-602, 1994
3. V. Tvarozek, Microsystem Technology in Biosensors. In: NATO book on Biosensors for Direct Monitoring of Environmental Pollutants in Field, edited by D.P. Nikolelis, Kluwer Academic Publishers, Dordrecht, 351-371,1998
4. P. Sutta Q. Jackuliak, V. Tvarozek and I. Novotny, Materials Structure in Chemi-stry,Biology,Physics and Technology, Vol. 3, No. 3, 205-208, 1996 (Printed in the Czech Republic)
5. J.I. Langford,./. Appl. Cryst., 11, 10-14,1978
6. R. Delhez, Th.H. De Keijser, and E.J. Mittemeijer, Surface Engineering Vol. 3, No. 4, 331-342, 1987
7. R. Delhez, Th.H. Dc Keijser, and E.J. Mittemeijer, Fresenius Z. Anal.Chem. 312, 1-16, 1982
8. I. Kraus, V.V. Trofimov, Rentgenova tenzomelrie, Academia Praha, 1988