Chemical etching of ion tracks in LiF crystals

Journal of Applied Physics

Volumn 83, Issue 7, 1998, Pages 3560-3564

  Trautmann, C ^a   Schwartz, K ^a   Geiss, O ^a  

^a GSI HELMHOLTZZENTRUM FÜR SCHWERIONENFORSCHUNG GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0004536174     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366572     Document Type: Article

References (22)

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