Kinetics of solid phase epitaxy in buried amorphous Si layers formed by MeV ion implantation

Applied Physics Letters

Volumn 69, Issue 7, 1996, Pages 925-927

  McCallum, J C ^a  

^a UNIVERSITY OF MELBOURNE   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0004533353     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116945     Document Type: Article

References (9)

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