Ferroelectric PB(ZR, TI)O3thin films prepared by metal target sputtering

Japanese Journal of Applied Physics

Volumn 26, Issue , 1987, Pages 18-21

  Croteau, Andrȳ ^a   Matsubara, Shogo ^a   Miyasaka, Yoichi ^a   Shohata, Nobuaki ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0004402415     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.7567/JJAPS.26S2.18     Document Type: Article

References (11)

1. T. Fukami, T. Sakuma, K. Tokunaga, and H. Tsuchiya: Proc. FMA-4.
2. T. Fukami, T. Sakuma, K. Tokunaga, and H. Tsuchiya:, 1983, Jpn. J. Appl. Phys. 22 Suppl. 2, p. 18.
3. A. Croteau and M. Sayer: Proc. 6th Int. Symp. on Applications of Ferroelectrics, Bethlehem, 1986.
4. A. Croteau and M. Sayer: IEEE, New York, p. 606.
5. H. Adachi, T. Mitsuyu, O. Yamazaki and K. Wasa: Proc. FMA-5.
6. H. Adachi, T. Mitsuyu, O. Yamazaki and K. Wasa:, 1985, Jpn. J. Appl. Phys. 24 (1985) 3, p. 13.
7. S. Matsubara, N. Shohata and M. Mikami: Proc. FMA-5, Kyoto, 1985.
8. S. Matsubara, N. Shohata and M. Mikami: Jpn. J. Appl. Phys. 24 (1985. 3, p. 10.
9. S. B. Krupanidhi, N. Maffei, M. Sayer and K. El-Assal: J. Appl. Phys. 54 (Nov. 1983) 6601.
10. A. Mansingh, K. Sreenivas and T. Sudersena Rao: Proc. 6th Int. Symp. on Applications of Ferroelectrics, Bethlehem, 1986.
11. A. Mansingh, K. Sreenivas and T. Sudersena Rao: IEEE, New York, p. 576.