Textures of thin films

Materials Science Forum

Volumn 273-275, Issue , 1998, Pages 55-66

  Oettel, H ^a   Klimanek, P ^a  

^a TU BERGAKADEMIE FREIBERG   (Germany)

Author keywords

ECD; Fiber Texture; Grain Growth; Oriented Nucleation; PVD; Thin Films

Indexed keywords

ANISOTROPY; CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; ELECTROCHEMISTRY; ELECTRODEPOSITION; EPITAXIAL GROWTH; INTERFACIAL ENERGY; MORPHOLOGY; NUCLEATION; TEXTURES; THIN FILMS;

ELECTROCHEMICAL DEPOSITION (ECD); PHYSICAL VAPOR DEPOSITION (PVD);

FILM GROWTH;

EID: 0004146796     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.273-275.55     Document Type: Article

References (6)

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2. I. Handreg; "Anwendung der quantitativen röntgenografischen Texturanalyse zur Untersuchung von Prozeß-Gefüge-Korrelationen bei der galvanischen Abscheidung von Cu-Schichten"; Thesis Freiberg University of Mining and Technology; 1997
3. P. Hartman, W.G. Perdok; On the relations between structure and morphology of crystals. I-III; Acta cryst. 8(1955), p. 49-52, 521-524, 525-529
4. L. Alberts, R. Leutenecker, G.K. Wolf; Texture of IBAD TiN films as a function of ion-beam intensity and angular incidence; Surf.&CoatingsTechnol. 84(1996) 443-447
5. J.M. Nieuwenhuizen, H.B. Haanstra; Philips Techn.Rev. 27(1966) 87
6. U. Schulz, H. Oettel, W. Bunk; Texture of EB-PVD thermal barrier coatings under variable deposition conditions; Z.Metallk. 87(1996) 488-492