A new ESCA instrument with improved surface sensitivity, fast imaging properties and excellent energy resolution

Journal of Electron Spectroscopy and Related Phenomena

Volumn 52, Issue C, 1990, Pages 747-785

  Gelius1, U ^a   Wannberg, B ^a   Baltzer, P ^a   Fellner Feldegg, H ^b   Carlsson, G ^b   Johansson, C G ^b   Larsson, J ^b   Munger P ^b   Vegerfors, G ^b  

^a UPPSALA UNIVERSITY   (Sweden)

^b Scienta Instrument AB   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0004104979     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/0368-2048(90)85063-F     Document Type: Article

References (37)

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2. Electron Spectroscopy with Monochromatized X-rays
3. Die Erzeugung lichtstarker Röntgenspektren mit Hilfe von Konkavkristallen
4. A high resolution ESCA instrument with X-ray monochromator for gases and solids
5. A high resolution multipurpose ESCA instrument with X-ray monochromator
6. Surface analysis and angular distributions in x-ray photoelectron spectroscopy
7. Solid state—and surface—analysis by means oF angular-dependent x-ray photoelectron spectroscopy
8. Ultrasoft-X-Ray Reflection, Refraction, and Production of Photoelectrons (100-1000-eV Region)
9. Core Level Electron Spectroscopy Studies of Surfaces and Adsorbates
10. A New Molecular Pump
11. Focusing of Electrons in Two Dimensions by an Inhomogeneous Magnetic Field
12. Imaging XPS?A new technique, I?principles
13. Second order transfer matrices of real magnetic and electrostatic sector fields
14. High-resolution x-ray photoemission spectra of silver
15. The Band Structure of Silver and Optical Interband Transitions
16. Spin-orbit projected d densities-of-states of Pd, Ag, Pt, and Au
17. Hartree-Slater subshell photoionization cross-sections at 1254 and 1487 eV
18. Evaluation of XPS-data of oxide layers
19. Calculations of electron inelastic mean free paths for 31 materials
20. Instrumentation for surface studies: XPS angular distributions
21. A position dependent particle counter using microchannel plates
22. Die schwache elektrische Einzellinse geringster sph�rischer Aberration
23. �ber einige Fehler von Elektronenlinsen
24. Elementary and advanced Lie algebraic methods with applications to accelerator design, electron microscopes, and light optics
25. Concept of an imaging XPS system