Modification of desorption phenomenon of Sb on Si surfaces by atomic hydrogen termination

Applied Physics Letters

Volumn 69, Issue 9, 1996, Pages 1267-1269

  Nakagawa, Kiyokazu ^a   Kimura, Yoshinobu ^a   Miyao, Masanobu ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0004029358     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117387     Document Type: Article

References (3)

1. A. P. Mills, Jr. and H. J. Grossmann, J. Appl. Phys. 78, 5830 (1995).
2. A. Ishizaka and Y. Shiraki, J. Electrochem. Soc. 133, 667 (1986).
3. R. A. Metzger and F. G. Allen, Surf. Sci. 137, 397 (1984).