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Volumn 75, Issue 2-3, 2000, Pages 174-176
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Structural study of plasma enhanced chemical vapour deposited silicon carbide films
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Author keywords
Annealing; Chemical vapour; Vapour deposited
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Indexed keywords
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EID: 0003984216
PISSN: 09215107
EISSN: None
Source Type: Journal
DOI: 10.1016/S0921-5107(00)00356-1 Document Type: Article |
Times cited : (7)
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References (11)
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