Smooth etching of various III/V and II/VI semiconductors by Cl2 reactive ion beam etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 3, 1996, Pages 1764-1772

  Yoshikawa, T ^a   Sugimoto, Y ^a   Sakata, Y ^a   Takeuchi, T ^a   Yamamoto, M ^a   Hotta, H ^a   Kohmoto, S ^a   Asakawa, K ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003831632     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588554     Document Type: Article

References (13)

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