Thermal stability of hydrogen and sulfur atoms in a-SiSx:H films

Journal of Applied Physics

Volumn 80, Issue 10, 1996, Pages 6028-6031

  Itoh, Takashi ^a   Nitta, Shoji ^a   Wang, S L ^b   Taylor, P C ^b  

^a GIFU UNIVERSITY   (Japan)

^b UNIVERSITY OF UTAH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003702828     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363602     Document Type: Review

References (19)

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