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Volumn 72, Issue 4, 1992, Pages 1378-1385
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Characterization of ultrathin oxide prepared by low-temperature wafer loading and nitrogen preannealing before oxidation
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0003546643
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.351749 Document Type: Article |
Times cited : (9)
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References (26)
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