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Volumn 72, Issue 4, 1992, Pages 1378-1385

Characterization of ultrathin oxide prepared by low-temperature wafer loading and nitrogen preannealing before oxidation

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Indexed keywords


EID: 0003546643     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.351749     Document Type: Article
Times cited : (9)

References (26)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.