Chemical vapor deposition of TiN films from tetrakis(ethylmethylamido)titanium and ammonia

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 12 B, 1998, Pages 6942-6945

  Lee, Jae Gab ^a   Choi, Jung Hwan ^a   Lee, Chongmu ^b   Hong, Ju Hwa ^c   Lee, Eun Gu ^d   Shin, Hyun Kook ^e   Hong, Hae Nam ^f  

^a Kookmin University   (South Korea)

^b Inha University   (South Korea)

^c Chungbuk National University   (South Korea)

^d Chosun University   (South Korea)

^e Jang Yeon Bldg   (South Korea)

^f Agency for Defence Development   (South Korea)

Author keywords

Conformality; MOCVD TiN; Premixing of the reactants; TEMAT and NH3

Indexed keywords

EID: 0003432882     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.6942     Document Type: Article

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