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Volumn 27, Issue 8, 1998, Pages 990-997

Influence of surface contamination on metal/metal bond contact quality

Author keywords

Ag plated Cu lead frames; Al bond pads; Au wire bonding; Au Ni coated multichip material (MCM); Plasma cleaning; Surface contamination; X ray photoelectron spectroscopy (XPS)

Indexed keywords


EID: 0003314746     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-998-0132-1     Document Type: Article
Times cited : (15)

References (30)
  • 9
    • 3743122888 scopus 로고    scopus 로고
    • DC-Hydrogen Plasma Cleaning in IC Packaging
    • N. Onda et al., DC-Hydrogen Plasma Cleaning in IC Packaging, Proc. of SEMICON Singapore (1996).
    • (1996) Proc. of SEMICON Singapore
    • Onda, N.1
  • 10
    • 3743078365 scopus 로고    scopus 로고
    • Plasmaunterstützte Prozesse in der Elektronik
    • E. Wandke, Plasmaunterstützte Prozesse in der Elektronik, Transfer, Nr. 40 (1996).
    • (1996) Transfer , vol.40
    • Wandke, E.1
  • 29
    • 3743111695 scopus 로고
    • Ph.D. thesis, University of Fribourg, Switzerland
    • A. Stalder, Ph.D. thesis, University of Fribourg, Switzerland (1995).
    • (1995)
    • Stalder, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.