Permeability of microstrip thin films of various materials

Journal of Applied Physics

Volumn 79, Issue 8 PART 2B, 1996, Pages 5913-5915

  Yamakawa, Kiyoshi ^a   Ise, Kazuyuki ^a   Honda, Naoki ^a   Ouchi, Kazuhiro ^a   Iwasaki, Shun Ichi ^b  

^a Akita Research Institute of Advanced Technology   (Japan)

^b TOHOKU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003098461     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.362170     Document Type: Article

References (6)

1. S. Takahashi, K. Yamakawa, N. Honda, and K. Ouchi, J. Magn. Magn. Mater. 148, 88 (1995).
2. M. Nose, K. Esashi, J. Kanehira, K. Shirakawa, and T. Masumoto, Proc. 4th Int. Conf. on Rapidly Quenched Materials, Sendai, 1981.
3. S. Takahashi, K. Yamakawa, N. Honda, K. Ouchi, and S. Iwasaki, J. Magn. Soc. Jpn. Supp. 18, 385 (1994).
4. S. Takahashi, K. Yamakawa, N. Honda, and K. Ouchi, IEEE Trans. Magn., Proc. of INTERMAG'95 (1995).
5. J. C. Slonczewski, B. Petek, and B. E. Argyle, IEEE Trans. Magn. MAG-24, 2045 (1988).
6. M. Ruhrig, W. Rave, and A. Hubert, J. Magn. Magn. Mater. 84, 102 (1990).