Large critical current densities in YBa2Cu3O 7-x thin films made at high deposition rates

Applied Physics Letters

Volumn 57, Issue 5, 1990, Pages 523-525

  Wu, X D ^a   Muenchausen, R E ^a   Foltyn, S ^a   Estler, R C ^a   Dye, R C ^a   Garcia, A R ^a   Nogar, N S ^a   England, P ^b   Ramesh, R ^b   Hwang, D M ^b   Ravi, T S ^b   Chang, C C ^b   Venkatesan, T ^b   Xi, X X ^c   Li, Q ^c   Inam, A ^c  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

^b TELCORDIA TECHNOLOGIES   (United States)

^c RUTGERS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003066211     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.104245     Document Type: Article

References (8)