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Volumn 3175, Issue , 1998, Pages 429-432
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The effects of processing conditions on PbGeTe film performances
a a,d a,d a b b b c c |
Author keywords
Multilayer; PbGeTe ZnS; PbTe ZnS; Refractive index; Single layer
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Indexed keywords
ADHESION;
FILM GROWTH;
FILM PREPARATION;
GERMANIUM;
IMAGE ANALYSIS;
LIGHT REFRACTION;
MULTILAYERS;
OPTICAL PROPERTIES;
OXIDE FILMS;
REFRACTIVE INDEX;
REFRACTOMETERS;
SILICON;
SILICON WAFERS;
SUBSTRATES;
THICK FILMS;
THIN FILM DEVICES;
THIN FILMS;
ZINC SULFIDE;
ADHESIVE STRENGTHS;
FILM PERFORMANCES;
OXIDE LAYERS;
PARTICLE STRUCTURES;
PBGETE/ZNS;
PBTE/ZNS;
PREFERRED ORIENTATIONS;
PROCESSING CONDITIONS;
SI SUBSTRATES;
SI WAFERS;
SINGLE LAYER;
SINGLE LAYERS;
THIN LAYERS;
X-RAY DIFFRACTIONS;
SEMICONDUCTING SILICON COMPOUNDS;
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EID: 0003004725
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.300721 Document Type: Conference Paper |
Times cited : (2)
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References (2)
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