Schottky barrier height measurement on NiSi2/Si(100) by capacitance microscope

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 2, 1996, Pages 1221-1223

  Khang, Y ^a   Mang, K M ^a   Booh, K H ^a   Kuk, Y ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002972328     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588519     Document Type: Article

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