Study on ferroelectric thin films for application to NDRO nonvolatile memories

Integrated Ferroelectrics

Volumn 6, Issue 1-4, 1995, Pages 23-34

  Nakao, Yuichi ^a   Nakamura, Takashi ^a   Kamisawa, Akira ^a   Takasu, Hidemi ^a  

^a ROHM CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002955121     PISSN: 10584587     EISSN: 16078489     Source Type: Journal    
DOI: 10.1080/10584589508019351     Document Type: Article

References (7)

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