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Volumn 33, Issue 2, 1999, Pages 119-123

Reactive ion etching of polymer films in an oxygen inductively coupled radiofrequency-discharge plasma

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[No Author keywords available]

Indexed keywords


EID: 0002949013     PISSN: 00181439     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (3)

References (11)
  • 8
    • 27544467890 scopus 로고
    • Engl. transl.
    • [High Energy Chem. (Engl. transl.), 1995, vol. 29, no. 1, p. 56].
    • (1995) High Energy Chem. , vol.29 , Issue.1 , pp. 56


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.