Plasma etching of Cr photo masks: Optimization of process conditions and CD control

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3236, Issue , 1997, Pages 94-103

  Constantine, C ^a   Johnson, D J ^a   Westerman, R J ^a   Coleman, T ^b   Faure, T ^c   Dubuque, L ^c  

^a Qualtx Technology Inc   (United States)

^b Etec Systems Inc   (United States)

^c IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002939045     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.301179     Document Type: Conference Paper

References (0)