Fast noncontact diffusion-process monitoring

Solid State Technology

Volumn 42, Issue 4, 1999, Pages 67-74

  DeBusk, Damon K ^a,c   Hoff, Andrew M ^b,d,e  

^a Cirent Semiconductor   (United States)

^b UNIVERSITY OF SOUTH FLORIDA   (United States)

^c Integration Technology Group   (United States)

^d Department of Electrical Engineering ^*

^e University of South Florida   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002778510     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (8)

1. A.M. Hoff, T.C. Esry, K. Nauka, "Monitoring Plasma Damage: A Real-time, Noncontact Approach," Solid State Technology, Vol. 7, pp. 139-152, July 1996.
2. 2 Interface Defects Induced by Plasma Processing," part of the SPIE Conference on In-Line Characterization Techniques for Performance and Yield Enhancements in Microelectronic Manufacturing II, Santa Clara, CA, September 1998, Proc., SPIE, Vol. 3509, pp. 126-136, 1998.
3. J. Lagowski et al., "Iron Detection in the Parts Per Quadrillion Range in Silicon Using Surface Photovoltage and Photo-dissociation of Iron-Boron Pairs," Appl. Phys. Lett., Vol. 63, pp. 3043-3045, 1993.
4. W. Henley, L. Jastrzebski, N. Haddad, Mat. Res. Soc. Symp. Proc., Vol. 315, p. 299, 1993.
5. P. Edelman et al., "Measurement of the Mobile Ion Concentration in the Oxide Layer of a Semiconductor Wafer," United States Letters Patent, 1998, Patent No. 5,773,989.
6. A.M. Hoff, D.K. DeBusk, "Mobile Charge Testing of Sodium Contaminated Thermal Oxides Using Corona Temperature Stressing," presented at Optical Characterization Techniques for High-Performance Microelectronic Manufacturing, October 1997, Austin, TX, Proc., SPIE, Vol. 3215, pp. 26-34, 1997.
7. L. Jastrzebski, W. Henley, C. Neuse, "Surface Photovoltage Monitoring of Heavy Metal Contamination in IC Manufacturing," Solid State Technology, Vol. 35, p. 27-36, December 1992.
8. B.E. Deal, "The Current Understanding of Charges in the Thermally Oxidized Silicon Structure," J. Electrochem. Soc., Vol. 121, 198C-207C, 1974.