Facile fabrication procedure for C60-doped silicon oxide thin films

Chemistry Letters

Volumn , Issue 10, 1997, Pages 995-996

  Hasegawa, Isao ^a   Shibusa, Koji ^a   Kobayashi, Satoshi ^a   Nonomura, Shuichi ^a   Nitta, Shoji ^a  

^a GIFU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002763505     PISSN: 03667022     EISSN: None     Source Type: Journal    
DOI: 10.1246/cl.1997.995     Document Type: Article

References (13)

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