Systematic investigations of nanostructuring by scanning tunneling microscopy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 1, 1996, Pages 48-53

  Koning R ^a   Jusko, O ^a   Koenders, L ^a   Schlachetzki, A ^b  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^b TECHNICAL UNIVERSITY OF BRAUNSCHWEIG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002655078     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588501     Document Type: Article

References (26)

1. Calibration specimen produced by NanoSensors, Dr. Olaf Wolter GmbH, distributed by LOT, Damstadt, Germany.
2. H. J. Mamin, S. Chiang, H. Birk, P. H. Guethner, and D. Rugar, J. Vac. Sci. Technol. B 9, 1398 (1991); H. J. Mamin, P. H. Guethner, and D. Rugar, Phys. Rev. Lett. 65, 2418 (1990).
3. H. J. Mamin, S. Chiang, H. Birk, P. H. Guethner, and D. Rugar, J. Vac. Sci. Technol. B 9, 1398 (1991); H. J. Mamin, P. H. Guethner, and D. Rugar, Phys. Rev. Lett. 65, 2418 (1990).
4. U. Staufer, L. Scandella, H. Rudin, H. J. Güntherodt, and N. Garcia, J. Vac. Sci. Technol. B 9, 1389 (1991).
5. E. E. Ehrichs and A. L. de Lozanne, J. Vac. Sci. Technol. A 8, 571 (1990).
6. H. Fuchs, Th. Schimmel, M. Lux-Steiner, and E. Bucher, Ultramicroscopy 42-44, 1295 (1992).
7. F. Grey, A. Kobayashi, H. Uchida, D. H. Huang, and M. Aono, in The Technology of Proximal Probe Lithography, edited by C. K. Marrian (SPIE, Belligham, WA, 1993), IS 10, p. 183.
8. R. S. Becker, J. A. Golovchenko, and B. Swartzentruber, Nature 325, 419 (1987).
9. J. I. Pascual, J. Méndez, J. Gómez-Herrero, A. M. Baró, N. Garcia, and V. T. Binh, Phys. Rev. Lett. 71, 1852 (1993).
10. U. Gratzke and G. Simon, Microelectron. Eng. 27, 35 (1995).
11. H. J. Mamin and D. Rugar, Phys. Rev. Lett. 72, 1128 (1994).
12. J. I. Pascual, J. Méndez, J. Gómez-Herrero, A. M. Baró, N. Garcia, and V. T. Binh, Phys. Rev. Lett. 72, 1129 (1994).
13. Y. Z. Li, L. Vazquez, R. Piner, R. P. Andres, and R. Reifenberger, Appl. Phys. Lett. 54, 1424 (1989).
14. P. F. Marella and R. F. Pease, Appl. Phys. Lett. 55, 2366 (1989).
15. Y. Z. Li, R. P. Andres, and R. Reifenberger, Appl. Phys. Lett. 55, 2366 (1989).
16. UHV-STM 1, Omicron Vakuumphysik, Taunusstein, Germany.
17. J. J. Boland, J. Vac. Sci. Technol. A 10, 2458 (1992).
18. L. J. Whitman, J. A. Stroscio, R. H. Dragoset, and R. J. Celotta, Science 251, 1206 (1991).
19. D. M. Eigler, C. P. Lutz, and W. R. Rudge, Nature 352, 600 (1991).
20. J. A. Stroscio, P. N. First, R. H. Dragoset, L. J. Whitman, D. T. Pierce, and R. J. Celotta, J. Vac. Sci. Technol. A 8, 284 (1990).
21. V. T. Binh, S. T. Purcell, G. Gardet, and N. Garcia, in Atomic and Nanometer-Scale Modification of Materials: Fundamentals and Applications, edited by P. Avouris, Nato Advanced Science Inst. Ser. E: Applied Science (Plenum, New York, 1993), p. 121.
22. N. M. Miskovsky, S. H. Park, J. He, and P. H. Cutler, J. Vac. Sci. Technol. B 11, 366 (1993).
23. K. S. Ralls, D. C. Ralph, and R. A. Buhrman, Phys. Rev. B 40, 11561 (1989).
24. T. T. Tsong, Phys. Rev. B 44, 13703 (1991).
25. I. W. Lyo and P. Avouris, Science 253, 173 (1991).
26. G. L. Kellog, Phys. Rev. B 29, 4304 (1984).