Stability of short-channel p-channel polysilicon thin-film transistors with ECR N2O-plasma gate oxide

IEEE Electron Device Letters

Volumn 20, Issue 1, 1999, Pages 12-14

  Lee, Jin Woo ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Ecr n2o plasma oxidation; Hot carrier effects; Poly si tft; Short channel; Stability

Indexed keywords

EID: 0002592679     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.737558     Document Type: Article

References (2)

1. J. S. Im and R. S. Sposili, "Crystalline Si films for integrated active-matrix liquid-crystal displays," MRS Bull., p. 39, Mar. 1996.
2. A. Kumar, K. P. Johnny, and K. O. Sin, "A simple TFT technology for display systems ton glass," in IEDM Tech. Dig., 1997, p. 515.