Experimental investigations of anisotropic etching of Si in tetramethyl ammonium hydroxide

Canadian Journal of Physics

Volumn 74, Issue , 1996, Pages

  Naseh, S ^a   Landsberger, L M ^a   Paranjape, M ^b   Kahrizi, M ^a  

^a Dept of Electrical and Computer Engineering   (Canada)

^b SIMON FRASER UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002562119     PISSN: 00084204     EISSN: None     Source Type: Journal    
DOI: 10.1139/p96-837     Document Type: Article

References (11)

1. U. Schnakenberg, W. Beneke, and P. Lange. Tech. Digest of 6th Int'l Conf. Solid State Sensors and Actuators (Transducers '91), SF June 24-28, 815 (1991).
2. O. Tabata, R. Asahi, H. Funabashi, K. Shimaoka, and S. Sugiyama. Sens. Actuators A, 34, 51 (1992).
3. A. Merlos, M. Acero, M.H. Bao, J. Bausells, and J. Esteve. Sens. Actuators A, 37-38, 737 (1993).
4. M. M. Abu-Zeid, D.L. Kendall, G.R. deGuel, and R. Galeazzi. Electrochemical Society Extended Abstracts, 85-1, Toronto, Canada, May 12-17, p.400 (1985).
5. I. Stiharu, R.B. Bhat, M. Kahrizi, and L.M. Landsberger. Proc. SPIE, 2045, 254 (1993).
6. S. Tan et al. IEEE MEMS Workshop, Oiso, Japan. January 25-29, 1994. p. 229.
7. M. Elwenspoek et al. IEEE MEMS Workshop, Oiso, Japan. January 25-29, 1994. p. 223.
8. H. Seidel et al. J. Electrochem. Soc. 137(11), 3612 (1990).
9. S. Tan, M. Reed, H. Han, and R. Boudreau. J. Micromech. Microeng. 4, 147 (1994).
10. W.S. Choi and J.G. Smits. J. Microelectromech. Syst. 2(2), 82 (1993).
11. D.L. Kendall. J. Vac. Sci. Technol. A, 8(4), 3598 (1990).