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Volumn 24, Issue 2, 1974, Pages 72-74

Photolocking-A new technique for fabricating optical waveguide circuits

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Indexed keywords


EID: 0002553318     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1655099     Document Type: Article
Times cited : (77)

References (9)
  • 5
    • 84950882998 scopus 로고    scopus 로고
    • For these experiments the arc was equipped with water and Pyrex filters to eliminate ir and hard uv light.
    • When focused so as to illuminate the entire slide, the near-uv flux was about [formula omitted] with most of this in the lines at 365 and 313 nm (approximately 3:2 intensity ratio). Exposure times were typically 10–30 min., or a total exposure of 6–18 [formula omitted]


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.